Category:
Other Fine Chemicals
CAS NO:
7790-91-2
Standard:
In-house Standards,
| Specifications | |
| Purity , % | 99.9 |
| Oxygen | ≤20 ppmv |
| Nitrogen | ≤50 ppmv |
| Hydrogen Fluoride | ≤700 ppmv |
| Ship | |
| DOT Shipping Name | Chlorine Trifluoride |
| DOT Classification | 2.3 |
| DOT Label | Poison Gas , Oxidiser and Corrosive |
| UN Number | UN 1045 |
| CAS No. | 7790-91-2 |
| CGA/DISS | 670/728 |
| Shipped as | Liquefied Gas |
| Technical Information | |
| Cylinder State @ 21.1°C | Liquid |
| Flammable Limits In Air | Non flammable |
| Auto Ignition Temperature (°C ) | - |
| Molecular Weight (g/mol) | 66.007 |
| Specific gravity (air =1) | 3.14 |
| Critical Temperature ( °C ) | 23.85 |
| Critical Pressure ( psig ) | 823.2 |
| Applications | |
| In the semiconductor industry, chlorine trifluoride is used to clean chemical vapour deposition chambers. It has the advantage that it can be used to remove semiconductor material from the chamber walls without having to dismantle the chamber. Unlike most of the alternative chemicals used in this role, it does not need to be activated by the use of plasma since the heat of the chamber is enough to make it decompose and react with the semiconductor material | |